Competitive Adsorption as a Route to Area-Selective Deposition

Autor:	Pengyuan Zhao, Jonathan Wong, Ka Un Lao, Yan Yang, Hsin-Yu Ko, Robert A. DiStasio, Taewon Suh, James R. Engstrom
Rok vydání:	2020
Předmět:	Work (thermodynamics) Materials science Competitive adsorption Chemical engineering General Materials Science Chemical vapor deposition Selective deposition
Zdroj:	ACS applied materialsinterfaces. 12(8)
ISSN:	1944-8252
Popis:	In this work, we have explored the use of a third species during chemical vapor deposition (CVD) to direct thin-film growth to occur exclusively on one surface in the presence of another. Using a combination of density functional theory (DFT) calculations and experiments, including in situ surface analysis, we have examined the use of 4-octyne as a coadsorbate in the CVD of ZrO
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::299ec4d4c4c844c8791993483c186819 https://pubmed.ncbi.nlm.nih.gov/32043857 Zobrazit plný text záznamu