Soft thermal nanoimprint with a 10 nm feature size
| Autor: | Dor Yehuda, Sivan Tzadka, Ashish Pandey, Mark Schvartzman |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
business.industry Chalcogenide glass 02 engineering and technology General Chemistry 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics medicine.disease_cause Elastomer 01 natural sciences 0104 chemical sciences Nanolithography Resist Mold Thermal Miniaturization medicine Optoelectronics 0210 nano-technology business Electron-beam lithography |
| Zdroj: | Soft Matter. 15:2897-2904 |
| ISSN: | 1744-6848 1744-683X |
| Popis: | Nanoimprinting with rigid molds offers almost unlimited pattern resolution, but it suffers from high sensitivity to defects, and is limited to pattering flat surfaces. These limitations can be addressed by nanoimprinting with soft molds. However, soft molds have been used so far with UV resists, and could not achieve a resolution and minimal feature size comparable to those of rigid molds. Here, we explore the miniaturization edge of soft nanoimprint molds, and demonstrate their compatibility with thermal imprint resists. To that end, we produced a pattern with 10 nm critical dimensions, using electron beam lithography, and used it to replicate nanoimprint molds by direct casting of an elastomer onto the patterned resist. We showed that the produced pattern can be faithfully transferred from the mold by thermal nanoimprinting. In addition, we showed that similar nanoimprint molds can also be produced by double replication, which includes nanoimprinting of a thermal resist with an ultrahigh resolution rigid mold, and replication of a soft mold from the imprint pattern. We also demonstrated our novel nanoimprinting approach in two unconventional applications: nanopatterning of a thermal resist on a lens surface, and direct nanoimprinting of chalcogenide glass. Our novel nanoimprint approach pushes the envelope of standard nanofabrication, and demonstrates its potential for numerous applications impossible up to now. |
| Databáze: | OpenAIRE |
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