Programmed line width roughness metrology by multitechniques approach
| Autor: | Yoann Blancquaert, Jérôme Reche, Guillaume Freychet, Patrice Gergaud, Thibault Labbaye, Maxime Besacier |
|---|---|
| Přispěvatelé: | Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA) |
| Rok vydání: | 2018 |
| Předmět: |
Materials science
Scattering Mechanical Engineering Mechanical engineering 02 engineering and technology Surface finish 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Line width Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Metrology 010309 optics Reliability (semiconductor) 0103 physical sciences [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics Electrical and Electronic Engineering 0210 nano-technology Critical dimension Lithography ComputingMilieux_MISCELLANEOUS Order of magnitude |
| Zdroj: | Journal of Micro/Nanolithography, MEMS, and MOEMS Journal of Micro/Nanolithography, MEMS, and MOEMS, Society of Photo-optical Instrumentation Engineers, 2018, 17 (04), pp.1. ⟨10.1117/1.JMM.17.4.041005⟩ Journal of Micro/Nanolithography, MEMS, and MOEMS, 2018, 17 (04), pp.1. ⟨10.1117/1.JMM.17.4.041005⟩ |
| ISSN: | 1932-5150 |
| Popis: | At modern manufacturing geometries, roughness control presents a huge challenge for the lithography step. For advanced nodes, this morphological aspect reaches the same order of magnitude as the critical dimension (CD). Hence, the control of roughness needs an adapted metrology. Specific samples with designed roughness have been manufactured using e-beam lithography. These samples have been characterized with three different methodologies: CD-scanning electron microscopy, optical critical dimension, and small angle x-ray scattering. The main goal is to compare the capability of each of these techniques in terms of reliability, type of information obtained, time to obtain the measurements, and level of maturity for the industry. The next step will be to develop a hybrid metrology approach for roughness determination with these techniques. |
| Databáze: | OpenAIRE |
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