Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing
| Autor: | Tao Lu, Sanaul Haque, S. Honari |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Fabrication
Materials science Physics and Astronomy (miscellaneous) Polishing FOS: Physical sciences 01 natural sciences law.invention 010309 optics symbols.namesake law 0103 physical sciences Surface roughness Rayleigh scattering 010306 general physics Absorption (electromagnetic radiation) Condensed Matter - Materials Science business.industry Materials Science (cond-mat.mtrl-sci) Wavelength symbols Optoelectronics Degradation (geology) Photolithography business Physics - Optics Optics (physics.optics) |
| DOI: | 10.48550/arxiv.2104.05227 |
| Popis: | Here we demonstrate that adding a chemo-mechanical polishing (CMP) procedure to conventional photolithography, a silica microdisk with ultra-high quality factors ($>10^8$) can be fabricated. By comparing with the intrinsic optical quality factor (Q) measured at 970~nm, we observe that due to the significantly reduced surface roughness, at 1550~nm wavelength the water molecule absorption at the cavity surface supersedes Rayleigh scattering as the dominant factor for Q degradation. 3 pages, 2 figures |
| Databáze: | OpenAIRE |
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