Growth kinetics and relationship between structure and mechanical properties of a-C(N):H films deposited in acetylene–nitrogen atmospheres
| Autor: | F. L. Freire, Luiz G. Jacobsohn, Gino Mariotto, D. F. Franceschini, M. M. Lacerda |
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| Rok vydání: | 1999 |
| Předmět: |
Materials science
Hydrogen Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Microstructure Nitrogen Surfaces Coatings and Films Amorphous solid chemistry.chemical_compound symbols.namesake Acetylene chemistry Plasma-enhanced chemical vapor deposition symbols Thin film Raman spectroscopy |
| Zdroj: | Scopus-Elsevier |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.581641 |
| Popis: | Amorphous hydrogenated carbon–nitrogen films, a-C(N):H, were deposited by plasma enhanced chemical vapor deposition using acetylene–nitrogen mixtures. Film composition and density were determined by means of ion beam techniques being the film microstructure studied by infrared and Raman spectroscopies. Films were obtained with nitrogen content up to 22 at. %. As for films obtained using other gas mixtures, the deposition rate showed a strong decrease upon nitrogen incorporation, although with a smaller rate. The film growth kinetic is discussed and some specific features of acetylene–nitrogen precursor gas mixtures are pointed out. A remarkable decrease on the C atom sp3 fraction was inferred for nitrogen contents higher than 10 at. %, and was correlated to the film density behavior. The mechanical hardness and internal stress were relatively insensitive to low nitrogen incorporation, with a systematic decreasing behavior for nitrogen contents above 10 at. %. |
| Databáze: | OpenAIRE |
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