Reactive ion etching of poly(vinylidene fluoride-trifluoroethylene) copolymer for flexible piezoelectric devices

Autor:	Kazusuke Maenaka, Takayuki Fujita, Deyuan Zhang, Yong Gang Jiang, Syohei Shiono, Hiroyuki Hamada
Rok vydání:	2013
Předmět:	Spin coating Multidisciplinary Materials science Analytical chemistry chemistry.chemical_element Isotropic etching chemistry Polymer chemistry Fluorine Limiting oxygen concentration Dry etching Reactive-ion etching General Polarization (electrochemistry) Microfabrication
Zdroj:	Chinese Science Bulletin. 58:2091-2094
ISSN:	1861-9541 1001-6538
Popis:	A microfabrication process for poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) based flexible piezoelectric devices is proposed using heat controlled spin coating and reactive ion etching (RIE) techniques. Dry etching of P(VDF-TrFE) in CF4+O2 plasma is found to be more effective than that using SF6+O2 or Ar+O2 feed gas with the same radiofrequency power and pressure conditions. A maximum etching rate of 400 nm/min is obtained using the CF4+O2 plasma with an oxygen concentration of 60% at an antenna power of 200 W and a platen power of 20 W. The oxygen atoms and fluorine atoms are found to be responsible for the chemical etching process. Microstructuring of P(VDF-TrFE) with a feature size of 10 μm is achieved and the patterned films show a high remanent polarization of 63.6 mC/m2.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::247167b18b801a84b2d117c21b2057b5 https://doi.org/10.1007/s11434-013-5836-9 Zobrazit plný text záznamu Full text from SpringerLink