Adaptive high-resolution Linnik interferometry for 3D measurement of microparticles
| Autor: | Eireen Käkel, Peter Lehmann, Benedikt Allendorf, Hartmut Hillmer, Uh-Myong Ha, Sebastian Hagemeier |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
Nanostructure business.industry 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Sample (graphics) Atomic and Molecular Physics and Optics Interference microscopy Characterization (materials science) Metrology Nanoimprint lithography law.invention 010309 optics Interferometry Optics Interference (communication) law 0103 physical sciences Optoelectronics 0210 nano-technology business |
| Zdroj: | Optics Letters. 44:3550 |
| ISSN: | 1539-4794 0146-9592 |
| DOI: | 10.1364/ol.44.003550 |
| Popis: | Tailored 3D microparticles and nanostructures lead to increasing possibilities in semiconductor industry or biomedical applications. In an interdisciplinary study we investigate the parallel production of such particles by using nanoimprint lithography in combination with their characterization based on interference microscopy. In this Letter we report on a metrological inspection, which tends to a universal measurement solution comparing the sample optically to a master object produced in the same way as the sample. |
| Databáze: | OpenAIRE |
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