Phase Formation and Oxidation Behavior at 500 °C in a Ni–Co–Al Thin-Film Materials Library
| Autor: | Jerome Richert, Alfred Ludwig, Sannakaisa Virtanen, Peer Decker, Martin Weiser, Dennis Naujoks |
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| Rok vydání: | 2016 |
| Předmět: |
Surface Properties
Annealing (metallurgy) 02 engineering and technology 01 natural sciences Phase Transition X-ray photoelectron spectroscopy Nickel 0103 physical sciences Alloys Thin film Phase diagram 010302 applied physics Ternary numeral system Chemistry Metallurgy Electric Conductivity Temperature Cobalt General Chemistry General Medicine Sputter deposition 021001 nanoscience & nanotechnology Phase formation Superalloy Chemical engineering 0210 nano-technology Oxidation-Reduction Aluminum |
| Zdroj: | ACS Combinatorial Science. 18:575-582 |
| ISSN: | 2156-8944 2156-8952 |
| Popis: | The complete ternary system Ni-Co-Al was fabricated as a thin film materials library by combinatorial magnetron sputtering and was annealed subsequently in several steps in Ar and under atmospheric conditions at 500 °C. Ni-Co-Al is the base system for both Ni- and Co-based superalloys. Therefore, the phases occurring in this system and their oxidation behavior is of high interest. The Ni-Co-Al materials library was investigated using high-throughput characterization methods such as optical measurements, resistance screening, automated EDX, automated XRD, and XPS. From the obtained data a thin film phase diagram for the Ni-Co-Al system in its state after annealing at 500 °C in air was established. Furthermore, a surface oxide composition map of the full Ni-Co-Al system for oxidation at 500 °C was concluded. As a result, it could be shown that at 500 °C an amount of 10 at. % Al is necessary for a Ni-Co-Al thin film to produce a protective Al-oxide scale. |
| Databáze: | OpenAIRE |
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