Sensitivity of an image plate system in the XUV (60 eV < E < 900 eV)
| Autor: | N. G. Link, B. C. Wilson, B. H. Failor, E. M. Gullikson, J. C. Riordan |
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| Rok vydání: | 2012 |
| Předmět: |
Range (particle radiation)
Materials science Physics - Instrumentation and Detectors business.industry FOS: Physical sciences Phosphor Instrumentation and Detectors (physics.ins-det) Physics - Plasma Physics Photodiode law.invention Plasma Physics (physics.plasm-ph) Optics Beamline law Extreme ultraviolet Calibration business Instrumentation Sensitivity (electronics) Mathematical Physics Energy (signal processing) |
| DOI: | 10.48550/arxiv.1202.1197 |
| Popis: | Phosphor imaging plates (IPs) have been calibrated and proven useful for quantitative x-ray imaging in the 1 to over 1000 keV energy range. In this paper we report on calibration measurements made at XUV energies in the 60 to 900 eV energy range using beamline 6.3.2 at the Advanced Light Source at Lawrence Berkeley National Laboratory. We measured a sensitivity of ~25 plus or minus 15 counts/pJ over the stated energy range which is compatible with the sensitivity of Si photodiodes that are used for time-resolved measurements. Our measurements at 900 eV are consistent with the measurements made by Meadowcroft et al. at ~1 keV. Comment: 7 pages, 2 figures |
| Databáze: | OpenAIRE |
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