Origins of wear-induced tungsten corrosion defects in semiconductor manufacturing during tungsten chemical mechanical polishing
Autor: | Seung-Hoon Choi, Melissa E. Kreider, Adam C. Nielander, Michaela Burke Stevens, Gaurav Ashish Kamat, Ja Eung Koo, Ki Ho Bae, Hoyoung Kim, Il Young Yoon, Bo Un Yoon, Kihyun Hwang, Dong Un Lee, Thomas F. Jaramillo |
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Rok vydání: | 2022 |
Předmět: | |
Zdroj: | Applied Surface Science. 598:153767 |
ISSN: | 0169-4332 |
Databáze: | OpenAIRE |
Externí odkaz: |