Moisture resistance of SU-8 and KMPR as structural material
Autor: | Joost Melai, Jurriaan Schmitz, Cora Salm, V.M. Blanco Carballo |
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Jazyk: | angličtina |
Rok vydání: | 2009 |
Předmět: |
Materials science
Structural material Moisture Radiation imaging Nanotechnology Photoresist Condensed Matter Physics Moisture resistance Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention SU-8 Adhesion strength Resist law SC-RID: Radiation Imaging detectors KMPR Direct shear test Electrical and Electronic Engineering Composite material Photolithography CMOS post-processing |
Zdroj: | Microelectronic engineering, 86(4-6), 765-768. Elsevier |
ISSN: | 0167-9317 |
DOI: | 10.1016/j.mee.2008.12.076 |
Popis: | This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application. |
Databáze: | OpenAIRE |
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