Thick rhodium electrodeposition on copper backing as the target for production of palladium-103
| Autor: | Mahdi Sadeghi, Hossein Afarideh, M. Haji-Saeid, P. Van den Winkel |
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| Rok vydání: | 2004 |
| Předmět: |
Health
Toxicology and Mutagenesis Inorganic chemistry Public Health Environmental and Occupational Health chemistry.chemical_element Hydrochloric acid Copper Pollution Rhodium Analytical Chemistry Metal chemistry.chemical_compound chemistry Nuclear Energy and Engineering Plating visual_art Sulfamic acid visual_art.visual_art_medium Radiology Nuclear Medicine and imaging Sulfate Spectroscopy Palladium |
| Zdroj: | Journal of Radioanalytical and Nuclear Chemistry. 262:665-672 |
| ISSN: | 1588-2780 0236-5731 |
| DOI: | 10.1007/s10967-004-0490-y |
| Popis: | The Rh target preparation for production of 103Pd was investigated by using a thick electrodeposition of rhodium metal on a copper backing. The electrodeposition experiments were performed in acidic sulfate media using RhCl3·3H2O, Rh2(SO4)3 (recovered from hydrochloric acid solution) and also in the commercially available Rhodex plating baths. For high current beam irradiation of a Rh target, the qualities of the deposit of the three baths were compared in terms of thermal shock, crack-free and morphology criteria. The quality of the plating obtained from a sulfate bath [Rh2(SO4)3] was comparable with the one obtained from commercially available Rhodex bath. The optimum conditions of the electrodepositions were as follows: 4.8 g rhodium [as Rh2(SO4)3], pH 2, DC current density of ca 8.5 mA·cm−2, 1% sulfamic acid (w/v) and temperature 40–60 °C. |
| Databáze: | OpenAIRE |
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