Interdiffusion in Au(120 nm)/Ni(70 nm) thin films at the low-temperature annealing in the different atmospheres
| Autor: | M.A. Vasylyev, S.M. Voloshko, Alona Tynkova, Adrian R. Rennie, Sergey I. Sidorenko |
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| Rok vydání: | 2013 |
| Předmět: |
Interdiffusion
Ni Auger electron spectroscopy Materials science Hydrogen Scanning electron microscope Annealing (metallurgy) Thin films Analytical chemistry chemistry.chemical_element Condensed Matter Physics Ni oxide Annealing Surfaces Coatings and Films law.invention Secondary ion mass spectrometry Nickel Dimples chemistry Optical microscope law Au Thin film Instrumentation |
| Zdroj: | Vacuum. 87:69-74 |
| ISSN: | 0042-207X |
| DOI: | 10.1016/j.vacuum.2012.07.005 |
| Popis: | The development of the interdiffusion processes and the surface morphology changes in thin films of Au(120 nm)/Ni(70 nm) during annealing at 200 °C for 20 min in vacuum with different residual atmosphere pressures of 10 −3 and 10 −6 Pa and in an environment of hydrogen at a pressure of 5 × 10 2 Pa have been studied. Secondary ion mass spectrometry, Auger electron spectroscopy, X-ray diffraction, optical microscopy, atomic force microscopy and scanning electron microscopy were used. Surface microdefects that form in the films are related to the local oxidation of nickel and to the stress that arises due to interdiffusion. Defect formation and reactions at the surface are found to be controlling factors in the transport of nickel to the surface and in the observed morphology. |
| Databáze: | OpenAIRE |
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