Dynamics of Ethene Adsorption on Clean and C-Contaminated Cu(410)
| Autor: | Luca Vattuone, Marco Smerieri, Mario Rocca, Letizia Savio, V. Venugopal, T. Kravchuk, J. Jupille |
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| Přispěvatelé: | St Anthony Falls Laboratory (SAFL), University of Minnesota [Twin Cities] (UMN), University of Minnesota System-University of Minnesota System, Dipartimento di Fisica, Università degli studi di Genova = University of Genoa (UniGe), Istituto dei Materiali per l'Elettronica ed il Magnetismo [Genova] (IMEM-CNR), National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), Technion - Israel Institute of Technology [Haifa], Institut des Nanosciences de Paris (INSP), Université Pierre et Marie Curie - Paris 6 (UPMC)-Centre National de la Recherche Scientifique (CNRS), Centre de résonance magnétique biologique et médicale (CRMBM), Aix Marseille Université (AMU)-Assistance Publique - Hôpitaux de Marseille (APHM)-Centre National de la Recherche Scientifique (CNRS), CNR, Italo-French University, Università di Genova, Consiglio Nazionale delle Ricerche (CNR), Assistance Publique - Hôpitaux de Marseille (APHM)-Aix Marseille Université (AMU)-Centre National de la Recherche Scientifique (CNRS) |
| Rok vydání: | 2009 |
| Předmět: |
Molecular adsorption
Chemistry Annealing (metallurgy) Ethene Cu(410) Inorganic chemistry 02 engineering and technology Contamination 010402 general chemistry 021001 nanoscience & nanotechnology Kinetic energy 01 natural sciences Dissociation (chemistry) 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials General Energy Adsorption Gas-surface interaction dynamics Potential energy surface Physical chemistry [PHYS.COND]Physics [physics]/Condensed Matter [cond-mat] Physical and Theoretical Chemistry Sticking probability 0210 nano-technology |
| Zdroj: | Journal of Physical Chemistry C Journal of Physical Chemistry C, 2009, 113 (49), pp.20875-20880. ⟨10.1021/jp9047924⟩ Journal of physical chemistry. C 113 (2009): 20875–20880. doi:10.1021/jp9047924 info:cnr-pdr/source/autori:Venugopal V.; Vattuone L.; Kravchuk T.; Smerieri M.; Savio L.; Jupille J.; Rocca M./titolo:Dynamics of Ethene Adsorption on Clean and C-Contaminated Cu(410)/doi:10.1021%2Fjp9047924/rivista:Journal of physical chemistry. C/anno:2009/pagina_da:20875/pagina_a:20880/intervallo_pagine:20875–20880/volume:113 Journal of Physical Chemistry C, American Chemical Society, 2009, 113 (49), pp.20875-20880. ⟨10.1021/jp9047924⟩ |
| ISSN: | 1932-7455 1932-7447 |
| DOI: | 10.1021/jp9047924 |
| Popis: | International audience; As recently established (J. Am. Chem. Soc. 2008, 130, 12552), ethene adsorption on Cu(410) occurs both molecularly and dissociatively, the latter resulting in carbon contamination of the Surface. Here we report on the coverage-dependent dynamics of C(2)H(4) adsorption on clean and carbon-contaminated Cu(410). For the bare surface, the initial sticking probability has a very weak dependence on kinetic energy and is almost independent of angle of incidence. Molecular adsorption is in both cases precursor-mediated and nonactivated. Ethene dissociation takes place during adsorption as well as upon annealing. Both paths proceed via a molecular precursor. The former is translationally activated, while the latter depends strongly on the heating rate. The presence of preadsorbed carbon, resulting from previous uptakes, affects both the sticking probability and the attained saturation coverage. The latter quantity is shown to be a sensitive probe of carbon precoverage. A scheme of the complicated potential energy surface of this system is derived and discussed. |
| Databáze: | OpenAIRE |
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