Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

Autor:	Mariana Alarcón-Correa, Wenwen Chen, Kwanghyo Son, Hyeon-Ho Jeong, Tung-Chun Lee, Insook Kim, Andrew G. Mark, Gisela Schütz, Peer Fischer
Rok vydání:	2015
Předmět:	Glancing angle deposition Materials science General Chemical Engineering Communication Multifunctional nanoparticles General Engineering General Physics and Astronomy Medicine (miscellaneous) Nanotechnology block copolymer micelle nanolithography Biochemistry Genetics and Molecular Biology (miscellaneous) Communications Nanoimprint lithography law.invention law glancing angle deposition General Materials Science nanoimprint lithography nanoparticle lithography shadow growth physical vapor deposition Plasmon Next-generation lithography
Zdroj:	Advanced Science
ISSN:	2198-3844
Popis:	A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1d6b331a2a3fd81c01244c826c46661f https://pubmed.ncbi.nlm.nih.gov/27980957 Zobrazit plný text záznamu Plný text ve formátu PDF Plný text ve formátu HTML
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