Correction to Ultrahigh Resolution Titanium Deep Reactive Ion Etching

Autor:	Masaru P. Rao, Dong Yan, Ryan A. Peck, Mathias W. Rommelfanger, Bryan W. K. Woo, Shannon C. Gott
Rok vydání:	2017
Předmět:	Materials science Ultrahigh resolution chemistry business.industry chemistry.chemical_element Deep reactive-ion etching Optoelectronics General Materials Science Reactive-ion etching business Titanium
Zdroj:	ACS applied materialsinterfaces. 9(27)
ISSN:	1944-8252
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1cbabdcec0c1a735bce4d458e193214d https://pubmed.ncbi.nlm.nih.gov/28534392 Zobrazit plný text záznamu