Focused electron beam induced etching of copper in sulfuric acid solutions
| Autor: | J. Todd Hastings, Matthew Bresin, Aurelien Botman, Lindsay Boehme, James Ranney |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Aqueous solution
Materials science Mechanical Engineering fungi technology industry and agriculture chemistry.chemical_element Bioengineering Nanotechnology Sulfuric acid macromolecular substances General Chemistry Copper Isotropic etching chemistry.chemical_compound stomatognathic system Chemical engineering chemistry Mechanics of Materials Etching (microfabrication) Cathode ray General Materials Science Electrical and Electronic Engineering Selectivity Environmental scanning electron microscope |
| Zdroj: | Nanotechnology. 26:495301 |
| ISSN: | 1361-6528 0957-4484 |
| DOI: | 10.1088/0957-4484/26/49/495301 |
| Popis: | We show here that copper can be locally etched by an electron-beam induced reaction in a liquid. Aqueous sulfuric acid (H2SO4) is utilized as the etchant and all experiments are conducted in an environmental scanning electron microscope. The extent of etch increases with liquid thickness and dose, and etch resolution improves with H2SO4 concentration. This approach shows the feasibility of liquid phase etching for material selectivity and has the potential for circuit editing. |
| Databáze: | OpenAIRE |
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