Characterization of polycrystalline SiC films grown by HW-CVD using silicon tetrafluoride
Autor: | Rinpei Hayashibe, Kiichi Kamimura, Tomohiko Yamakami, Takahiro Kida, Katsuya Abe, Yohei Nagasaka |
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Jazyk: | angličtina |
Rok vydání: | 2008 |
Předmět: |
Chemistry
Metals and Alloys Mineralogy chemistry.chemical_element Surfaces and Interfaces Substrate (electronics) Chemical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid Dilution chemistry.chemical_compound Chemical engineering Etching (microfabrication) Materials Chemistry Silicon tetrafluoride Fluorine Crystallite |
Zdroj: | Thin solid films. 516(5):637-640 |
ISSN: | 0040-6090 |
Popis: | Article THIN SOLID FILMS. 516(5): 637-640 (2008) |
Databáze: | OpenAIRE |
Externí odkaz: |