Comparison of wavefront sensing devices

Autor: David T Vroman, Kerry D Solomon, Helga P Sandoval, Luis E. Fernández de Castro
Rok vydání: 2004
Předmět:
Zdroj: Ophthalmology Clinics of North America. 17:119-127
ISSN: 0896-1549
Popis: Wavefront measurement is an emerging technology that can evaluate low-order and high-order aberrations. This review compiles the different wavefront sensing devices and compares the most popular Hartmann-Shack aberrometers.
Databáze: OpenAIRE