Comparison of wavefront sensing devices
Autor: | David T Vroman, Kerry D Solomon, Helga P Sandoval, Luis E. Fernández de Castro |
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Rok vydání: | 2004 |
Předmět: | |
Zdroj: | Ophthalmology Clinics of North America. 17:119-127 |
ISSN: | 0896-1549 |
Popis: | Wavefront measurement is an emerging technology that can evaluate low-order and high-order aberrations. This review compiles the different wavefront sensing devices and compares the most popular Hartmann-Shack aberrometers. |
Databáze: | OpenAIRE |
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