Modeling of the low-temperature production of gas-sensitive tin oxide films

Autor:	V. V. Kisin, V. V. Simakov, Victor V. Sysoev, S. A. Voroshilov
Předmět:	chemistry.chemical_compound Materials science Physics and Astronomy (miscellaneous) Chemical engineering chemistry Sputtering Annealing (metallurgy) Oxide Tin oxide Stoichiometry Indium tin oxide
Zdroj:	Scopus-Elsevier
Popis:	The deposition of tin oxide films by reactive sputtering of a stoichiometric target is investigated. Conditions are determined for the formation of a crystal layer structure and the acquisition of gas sensitivity without subsequent high-temperature annealing.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1a87854284376e660556a1423d9495ed http://www.scopus.com/inward/record.url?eid=2-s2.0-0033247195&partnerID=MN8TOARS Zobrazit plný text záznamu