Influence of Fabrication Parameters on Crystallization, Microstructure, Surface Composition, and Optical Behavior of MgO Thin Films Deposited by rf Magnetron Sputtering

Autor: M. Cardenas, J. E. Alfonso, José F. Marco
Rok vydání: 2012
Předmět:
Zdroj: Digital.CSIC. Repositorio Institucional del CSIC
instname
ISSN: 1557-1947
1557-1939
DOI: 10.1007/s10948-012-1460-1
Popis: In this work MgO thin films have been grown onto common glass substrates by magnetron rf sputtering from a MgO (99.99%) target with dimensions of 4″×1/4″. Basically, we found the optimum conditions for deposition such as working pressure (7×10-3 mbar), the power applied to the target (400 W) and the flow of Ar (20 sccm). The films have been characterized by X-ray diffraction (XRD) at a grazing angle at θ-2θ configuration, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and transmittance studies. The XRD results show that to reproduce the polycrystalline phase of the target, there is a power threshold of 250 W. AFM results indicate that the films present average roughness of the 200 Å and grain size of 1100 Å. XPS shows a surface composition of the films most external 5 nm, indicating the presence of MgO and Mg(OH)2. The optical characterization indicates that the films have a high absorption coefficient for wavelengths below 310 nm, and between 450 to 850 nm they showed a transmittance average of 90%. © 2012 Springer Science+Business Media, LLC.
Databáze: OpenAIRE
Externí odkaz: