Resolving the adsorption of molecular O 2 on the rutile TiO 2 (110) surface by noncontact atomic force microscopy

Autor:	Ulrike Diebold, Igor Sokolović, Martin Calkovský, Margareta Wagner, Michael Schmid, Cesare Franchini, Michele Reticcioli, Martin Setvin
Přispěvatelé:	Sokolovic I., Reticcioli M., Calkovsky M., Wagner M., Schmid M., Franchini C., Diebold U., Setvin M.
Rok vydání:	2020
Předmět:	Multidisciplinary Materials science Oxide chemistry.chemical_element Electron Substrate (electronics) Oxygen O2 oxide TiO2 nc-AFM chemistry.chemical_compound Adsorption chemistry Chemical physics Rutile Molecule Density functional theory Tip functionalization
Zdroj:	Proceedings of the National Academy of Sciences. 117:14827-14837
ISSN:	1091-6490 0027-8424
DOI:	10.1073/pnas.1922452117
Popis:	Significance Molecular O 2 on semiconducting metal oxides, its adsorption, response to thermal treatment, UV irradiation, and electron/hole injection is at the heart of a wide range of technologies. These processes were studied molecule by molecule on the prototypical model oxide T i O 2 (110), using noncontact AFM. We show that the nonintrusive nature of the nc-AFM and its exceptional spatial resolution due to the functionalization of the tip with a terminal O atom allow identifying oxygen adsorption geometries which were not previously determined by other techniques. In combination with density functional theory calculations, we explain the charge states of the various adsorbed oxygen species, their dynamics upon annealing and UV irradiation, and the role of electron exchange with the T i O 2 substrate.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1a47d8bcfd60d5078e241168c25ad265 https://doi.org/10.1073/pnas.1922452117 Zobrazit plný text záznamu