Thermal annealing of amorphous Ti-Si-O thin films
| Autor: | Ulrich Gottlieb, Marc Audier, Odette Chaix-Pluchery, Jean-Luc Deschanvres, Abbas Hodroj |
|---|---|
| Přispěvatelé: | Laboratoire des matériaux et du génie physique (LMGP ), Institut National Polytechnique de Grenoble (INPG)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS) |
| Jazyk: | angličtina |
| Rok vydání: | 2008 |
| Předmět: |
multilayered structure
Anatase Materials science Annealing (metallurgy) 02 engineering and technology Chemical vapor deposition 01 natural sciences law.invention symbols.namesake Mictamict law 0103 physical sciences General Materials Science Crystallization Fourier transform infrared spectroscopy Thin film 010302 applied physics Mechanical Engineering [CHIM.MATE]Chemical Sciences/Material chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics Amorphous solid Ti-Si-O films Chemical engineering Mechanics of Materials symbols 0210 nano-technology Raman spectroscopy aerosol CVD |
| Zdroj: | Journal of Materials Research Journal of Materials Research, Cambridge University Press (CUP), 2008, 23 (3), pp.755. ⟨10.1557/JMR.2008.0088⟩ |
| ISSN: | 0884-2914 |
| Popis: | Ti–Si–O thin films were deposited using an aerosol chemical vapor deposition process at atmospheric pressure. The film structure and microstructure were analyzed using several techniques before and after thermal annealing. Diffraction results indicate that the films remain x-ray amorphous after annealing, whereas Fourier transform infrared spectroscopy gives evidence of a phase segregation between amorphous SiO2 and well-crystallized anatase TiO2. Crystallization of anatase TiO2 is also clearly shown in the Raman spectra. Transmission electron microscopy analysis indicates that anatase TiO2 nanograins are embedded in a SiO2 matrix in an alternated SiO2/TiO2 multilayer structure. |
| Databáze: | OpenAIRE |
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