Micropatterning of Silica Nanoparticles by Electrospray Deposition through a Stencil Mask
| Autor: | Atsushi Hotta, Kazuhiro Uchida, Norihisa Miki, Koichi Hishida, Kazuhiko Higashi |
|---|---|
| Rok vydání: | 2014 |
| Předmět: |
Electrospray
Silver Materials science Atmospheric pressure business.industry Reproducibility of Results Nanotechnology Single step Silicon Dioxide Spectrum Analysis Raman Stencil Computer Science Applications Silica nanoparticles Medical Laboratory Technology symbols.namesake symbols Nanoparticles Optoelectronics Deposition (phase transition) business Raman scattering Micropatterning |
| Zdroj: | SLAS Technology. 19:75-81 |
| ISSN: | 2472-6303 |
| DOI: | 10.1177/2211068213495205 |
| Popis: | This article describes the local deposition, or micropatterning, of silica nanoparticles (NPs) using an electrospray method with a stencil mask. The proposed technique can be carried out in a single step at room temperature and atmospheric pressure under dry conditions, allowing it to be used with water- or vacuum-sensitive materials, and leading to cost reductions and high throughput. An evaluation of the patterning accuracy using a 20 µm thick mask showed that for patterns with line widths greater than 50 µm, the pattern was reproduced with an accuracy greater than 95%. When silver NPs were preferably deposited on the silica NPs using a modified silver mirror reaction, they were found to exhibit strong surface-enhanced Raman scattering effects. The proposed process is readily applicable to the development of high-performance micro total analysis systems. |
| Databáze: | OpenAIRE |
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