Electron and laser radiation as sources of zirconia film deposition
| Autor: | Ernst Wolfgang Kreutz, T. Leyendecker, O. Lemmer, Georg Erkens, M. Alunovic, D.A. Wesner, A. Voss |
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| Přispěvatelé: | Publica |
| Rok vydání: | 1995 |
| Předmět: |
Materials science
Scanning electron microscope beam parameter Analytical chemistry Substrate (electronics) Electron law.invention symbols.namesake scanning electron adapted technologie vapour plume X-ray photoelectron spectroscopy law Materials Chemistry Thin film beam evaporation Surfaces and Interfaces General Chemistry Condensed Matter Physics Laser Surfaces Coatings and Films x-ray diffraction Physical vapor deposition laser beam symbols sputtering Raman spectroscopy |
| Zdroj: | Surface and Coatings Technology. :1005-1011 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/0257-8972(95)08319-7 |
| Popis: | The deposition of zirconia films by electron and laser radiation on steel substrates was investigated as a function of beam parameters and processing variables. The type, the number and the angular distribution of the particles in the vapour/plasma have been studied in order to influence the film growth on the substrate via variation of beam parameters and processing variables. The composition of the vapour/plasma and the energy of the particles was measured by emission spectroscopy, and the geometry of the vapour/plasma plume by high-speed photography. The properties of the films were investigated using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy and mechanical testing by hardness measurements. Different film structures are obtained by matching the beam parameters, processing variables and geometrical arrangement of target and substrate, which are discussed in view of applications. |
| Databáze: | OpenAIRE |
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