Depth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron
| Autor: | Alberto Somoza, Sebastiano Mariazzi, Roberto S. Brusa, Jorge Feugeas, J. Bürgi, Mattia Piccoli, Carlos Eugenio Macchi, Javier García Molleja, Edoardo Bemporad |
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| Přispěvatelé: | Macchi, C, Burgi, J, Garcıa Molleja, J, Mariazzi, S, Piccoli, Mattia, Bemporad, Edoardo, Feugeas, J, Sennen Brusa, R, Somoza, A. |
| Jazyk: | angličtina |
| Rok vydání: | 2014 |
| Předmět: |
Materials science
Silicon business.industry Ciencias Físicas Positron annihilation Analytical chemistry Reactive sputter magnetron chemistry.chemical_element Substrate (electronics) Nitride Condensed Matter Physics Electronic Optical and Magnetic Materials Positron annihilation spectroscopy chemistry Sputtering Cavity magnetron Optoelectronics Thin film Spectroscopy business Instrumentation Aluminum nitride CIENCIAS NATURALES Y EXACTAS Films Física de los Materiales Condensados |
| Popis: | It is well-known that the characteristics of aluminum nitride thin films mainly depend on their morphologies, the quality of the film-substrate interfaces and the open volume defects. A study of the depth profiling and morphological characterization of AlN thin films deposited on two types of Si substrates is presented. Thin films of thicknesses between 200 and 400 nm were deposited during two deposition times using a reactive sputter magnetron. These films were characterized by means of X-ray diffraction and imaging techniques (SEM and TEM). To analyze the composition of the films, energy dispersive X-ray spectroscopy was applied. Positron annihilation spectroscopy, specifically Doppler broadening spectroscopy, was used to gather information on the depth profiling of open volume defects inside the films and the AlN films-Si substrate interfaces. The results are interpreted in terms of the structural changes induced in the films as a consequence of changes in the deposition time (i.e., thicknesses) and of the orientation of the substrates. Fil: Macchi, Carlos Eugenio. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina Fil: Burgi, Juan Mauel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Rosario. Instituto de Física de Rosario (i); Argentina Fil: García Molleja, Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Rosario. Instituto de Física de Rosario (i); Argentina Fil: Mariazzi, Sebastiano. Universitá di Trento. Dipartimento di Fisica; Italia Fil: Piccoli, Mattia. Universitá di Roma Tre. Dipartimento di Ingegneria Meccanica ed Industriale; Italia Fil: Bemporad, Edoardo. Universitá di Roma Tre. Dipartimento di Ingegneria Meccanica ed Industriale; Italia Fil: Feugeas, Jorge Nestor. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Rosario. Instituto de Física de Rosario (i); Argentina Fil: Sennen Brusa, Roberto . Universitá di Trento. Dipartimento di Fisica; Italia Fil: Somoza, Alberto Horacio. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas; Argentina |
| Databáze: | OpenAIRE |
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