Properties of sputter-deposited Ni-Mn-Ga thin films

Autor: Volodymyr A. Chernenko, Michael Hagler, Peter Müllner, Stefano Besseghini, Makoto Ohtsuka, Francesco Stortiero
Jazyk: angličtina
Rok vydání: 2008
Předmět:
Zdroj: Materials science & engineering. A, Structural materials: properties, microstructure and processing 481 (2008): 271–274. doi:10.1016/j.msea.2006.12.206
info:cnr-pdr/source/autori:Chernenko V.A.; Besseghini S.; Hagler M.; Mullner P.; Ohtsuka M.; Stortiero F./titolo:Properties of sputter-deposited Ni-Mn-Ga thin films/doi:10.1016%2Fj.msea.2006.12.206/rivista:Materials science & engineering. A, Structural materials: properties, microstructure and processing/anno:2008/pagina_da:271/pagina_a:274/intervallo_pagine:271–274/volume:481
DOI: 10.1016/j.msea.2006.12.206
Popis: Sub-micrometer Ni–Mn–Ga films on MgO(0 0 1) single-crystalline wafers have been prepared by radio-frequency magnetron sputtering. The structural and magnetic states of the as-received (quasi-amorphous phase) and annealed (highly ordered martensitic phase at T = 300 K) films have been examined by X-ray diffraction, and measurements of resistivity and magnetization. The annealed films demonstrate a transformation behavior typical for the bulk and show a thickness dependence of the magnetic properties.
Databáze: OpenAIRE