Copper deposition at segmented, reticulated vitreous carbon cathode in Hull cell
| Autor: | Sheelagh A. Campbell, Frank C. Walsh, C. Ponce-de-León, Ravichandra Tangirala, Chee Tong John Low |
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| Rok vydání: | 2010 |
| Předmět: |
Materials science
Metallurgy Metals and Alloys Analytical chemistry Limiting current chemistry.chemical_element Surfaces and Interfaces Electrolyte Condensed Matter Physics Copper Cathode Surfaces Coatings and Films Anode law.invention chemistry Mechanics of Materials law Electrode Constant current Carbon |
| Zdroj: | Transactions of the IMF. 88:84-92 |
| ISSN: | 1745-9192 0020-2967 |
| DOI: | 10.1179/174591910x12646070884872 |
| Popis: | The electrodeposition of copper from an acid sulphate solution has been studied in a Hull cell fitted with four types of cathode; a carbon plate or a reticulated vitreous carbon (RVC) sheet was used either in a continuous or segmented form. The rates of mass transport to the planar plate and RVC electrodes have been compared in static and stirred electrolytes containing 50, 75 and 100 mmol dm–3 CuSO4 in 0·5 mol dm–3 Na2SO4 at pH 2 and 298 K. The cathodes were divided into 10 equal sections and current vs. potential curves were obtained for each section at a constant current up to 140 mA. The current distribution over the cathodes followed a logarithmic decay with distance along the cathode; segments nearest to the anode experienced the highest rate of copper deposition. |
| Databáze: | OpenAIRE |
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