Synchronizing Decentralized Control Loops for Overall Performance Enhancement: A Youla Framework Applied to a Wafer Scanner
| Autor: | Mmj Marc van de Wal, Tae Tom Oomen, Enzo Evers |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
0209 industrial biotechnology
Engineering Scanner Decentralized control Mechatronic systems business.industry 020208 electrical & electronic engineering Synchronizing Control engineering 02 engineering and technology Motion control Decentralised system Coupling 020901 industrial engineering & automation Coupling (computer programming) Motion Control Systems Control and Systems Engineering Control theory 0202 electrical engineering electronic engineering information engineering Reticle Performance improvement business |
| Zdroj: | IFAC-PapersOnLine. 50:10845-10850 |
| ISSN: | 2405-8963 |
| DOI: | 10.1016/j.ifacol.2017.08.2382 |
| Popis: | Manufacturing equipment often consists of multiple subsystems. For instance, in lithographic IC manufacturing, both a reticle stage and a wafer stage move synchronously. Traditionally, these subsystems are divided into manageable subproblems, at the expense of a suboptimal overall solution. The aim of this paper is to develop a framework for overall system performance improvement. The method pursued in this paper builds on traditional designs, and extends these through a bi-directional controller coupling. The aim here is to optimize a criterion that species overall system performance. To achieve this, a new parameterization that relates to the Youla parameterization is developed that connects the bi-directional controller parameter affinely to the overall control criterion, which enables a systematic design. The performance improvement is confirmed in a case study using measured data from an industrial wafer scanner. |
| Databáze: | OpenAIRE |
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