X-ray Full Field Microscopy at 30 keV

Autor: F Marschall, A Last, M Simon, M Kluge, V Nazmov, H Vogt, M Ogurreck, I Greving, J Mohr
Jazyk: angličtina
Rok vydání: 2014
Předmět:
Zdroj: Journal of physics / Conference Series 499, 012007 (2014). doi:10.1088/1742-6596/499/1/012007
22nd International Congress on X-Ray Optics and Microanalysis, Hamburg, Germany, 2016-09-02-2016-09-06
Journal of physics / Conference Series, 499 (1), Art.Nr.: 012007/1-6
Marschall, F.; Last, A.; Simon, M.; Kluge, M.; Nazmov, V.; Vogt, H.; Ogurreck, M.; Greving, I.; Mohr, J.: X-ray Full Field Microscopy at 30 keV. In: Journal of Physics: Conference Series . Vol. 499 (2014) 012007. (DOI: 10.1088/1742-6596/499/1/012007)
ISSN: 1742-6596
1742-6588
DOI: 10.1088/1742-6596/499/1/012007
Popis: 22nd International Congress on X-Ray Optics and Microanalysis, Hamburg, Germany, 2 Sep 2016 - 6 Sep 2016; Journal of physics / Conference Series 499, 012007 (2014). doi:10.1088/1742-6596/499/1/012007
In our X-ray full field microscopy experiments, we demonstrated a resolution better than 260 nm over the entire field of view of 80 μm x 80 μm at 30 keV. Our experimental setup at PETRA III, P05, had a length of about 5 m consisting of an illumination optics, an imaging lens and a detector. For imaging, we used a compound refractive lens (CLR) consisting of mr-L negative photo resist, which was fabricated by deep X-ray lithography. As illumination optics, we choose a refractive rolled X-ray prism lens, which was adapted to the numerical aperture of the imaging lens.
Published by IOP Publ., Bristol
Databáze: OpenAIRE