| Autor: |
Anwei Liu, Bayram Yenikaya, Oleg Alexandrov, Steven Chen, Apo Sezginer, Ali Mokhberi |
| Rok vydání: |
2009 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.829938 |
| Popis: |
We present a model-based method of generating and optimizing sub-resolution assist features. Assist feature generation is based on a focus sensitivity map derived from a cost function that minimizes the variations in the printed pattern with respect to focus change. We also demonstrate a method to generate mask-friendly SRAF polygons from the focus sensitivity map. After model-based placement, assist features and the main polygons are optimized together by moving their edge segments. One of the optimization goals is that side-lobes and assist features should not print. This is enforced by computing image on a two dimensional grid. We demonstrate the process window improvement for a contact layer example. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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