Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
| Autor: | Jin-Hua Huang, Kartika Chandra Sahoo, Yi Yao Lu, Edward Yi Chang, Chun Wei Chang, Men Ku Lin, Chun Chi Chen |
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| Rok vydání: | 2009 |
| Předmět: |
Fabrication
Materials science Nanotechnology Reflectance law.invention chemistry.chemical_compound Materials Science(all) law Etching (microfabrication) Nano Solar cell lcsh:TA401-492 General Materials Science Anti-reflective coatings Nano Express business.industry Condensed Matter Physics SWS fabrication Wavelength Anti-reflective coating Silicon nitride chemistry Optoelectronics lcsh:Materials of engineering and construction. Mechanics of materials Inductively coupled plasma business Sub-wavelength Structure |
| Zdroj: | Nanoscale Research Letters Nanoscale Research Letters, Vol 4, Iss 7, Pp 680-683 (2009) |
| ISSN: | 1556-276X |
| DOI: | 10.1007/s11671-009-9297-7 |
| Popis: | We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen. |
| Databáze: | OpenAIRE |
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