Optical absorption and structural characterization of reactively sputtered tellurium suboxide thin films
| Autor: | M.C. Nicotra, M. Re, Roberto Rella, Pietro Siciliano, M. Di Giulio |
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| Přispěvatelé: | DI GIULIO, Massimo, M. C., Nicotra, M., Re, R., Rella, P., Siciliano |
| Rok vydání: | 1993 |
| Předmět: |
Fused quartz
Suboxide Absorption spectroscopy business.industry Analytical chemistry General Physics and Astronomy chemistry.chemical_element Surfaces and Interfaces General Chemistry Condensed Matter Physics Surfaces Coatings and Films law.invention Optics chemistry Sputtering law Thin film Tellurium Spectroscopy business Refractive index |
| Zdroj: | Applied Surface Science. :313-318 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/0169-4332(93)90678-5 |
| Popis: | Tellurium suboxide (TeO x thin films were deposited on non-intentionally heated fused quartz substrates by RF reactive sputtering, with x = 1.3, as calculated from Rutherford backscattering spectroscopy measurements. Optical studies were performed in air at room temperature for both as-deposited and thermally annealed (250°C for 5 min in Ar atmosphere) films. The refractive index n and the extinction coefficient k were evaluated through transmissivity and reflectivity measurements at room temperature in the range of wavelengths between 200 and 1500 nm. The optical absorption spectrum as a function of the incident photon energy was also determined in order to evaluate the optical gap. Finally electron microscopy analysis has revealed that the film structure attains a shorter range order after the annealing. |
| Databáze: | OpenAIRE |
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