Thermodynamic consideration of SiN and SiHN systems for silicon nitride powder production in thermal plasma
| Autor: | Života G. Kostić, Predrag Stefanovic, Pavle B. Pavlovic |
|---|---|
| Rok vydání: | 1996 |
| Předmět: |
Materials science
Silicon Evaporation Thermodynamics chemistry.chemical_element 02 engineering and technology 7. Clean energy 01 natural sciences chemistry.chemical_compound 0103 physical sciences Materials Chemistry 010302 applied physics Quenching Process Chemistry and Technology Plasma Atmospheric temperature range 021001 nanoscience & nanotechnology Nitrogen Surfaces Coatings and Films Electronic Optical and Magnetic Materials Chemical engineering chemistry Silicon nitride Ceramics and Composites Stagnation enthalpy 0210 nano-technology |
| Zdroj: | Ceramics International |
| ISSN: | 0272-8842 |
| DOI: | 10.1016/0272-8842(95)00072-0 |
| Popis: | The results of equilibrium composition and total enthalpy computation in the temperature range of 1000–6000 K and at 1 bar for SiN and SiHN systems are presented in the paper. These data enable temperature and energy parameters determination and optimization of the process for ultrafine silicon nitride powder production, in which silicon powder evaporation in a nitrogen thermal plasma is followed by quenching with nitrogen or ammonia. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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