In Situ Stress Measurement of Electrodeposited Ni Films by Television Holographic Interferometry
Autor: | Hitoshi Matsuda, Satoshi Kakunai, Naoki Fukumuro, Shinji Yae, Takayoshi Do |
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Rok vydání: | 2010 |
Předmět: | |
Zdroj: | ECS Transactions. 25:27-34 |
ISSN: | 1938-6737 1938-5862 |
DOI: | 10.1149/1.3335489 |
Popis: | In situ stress measurements of electrodeposited Ni films from a sulfate bath during deposition were carried out by television holographic interferometry. The effect of the addition of saccharin sodium on the internal stress in the Ni films was studied. Structure change with film growth was investigated by cross-sectional TEM observation. Quantitative analysis of impurities and hydrogen in films was performed. The stress behaviors of Ni films changed drastically from a tensile direction to a compressive direction with an increase of the concentration of saccharin sodium. |
Databáze: | OpenAIRE |
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