Femtosecond laser nanomachining initiated by ultraviolet multiphoton ionization
| Autor: | Qiumei Bian, Zenghu Chang, Shuting Lei, Paul B. Corkum, Xiaoming Yu |
|---|---|
| Rok vydání: | 2013 |
| Předmět: |
Femtosecond pulse shaping
Combined pulse Materials science medicine.disease_cause Fluence Photoionization law.invention Nanomachining Ultrashort pulses Optics Near-infrared Multiphoton intrapulse interference phase scan law Damage features medicine Rate-equation models Ultrafast lasers Multiphoton ionization Pulse (signal processing) business.industry Fused silica Laser Atomic and Molecular Physics and Optics Damage threshold Extreme ultraviolet Femtosecond Optoelectronics business Ultraviolet Shorter wavelength |
| Zdroj: | Optics express. 21(20) |
| ISSN: | 1094-4087 |
| Popis: | We report on the experimental results of 300 nm features generated on fused silica using a near-infrared (IR) femtosecond laser pulse initiated by an ultraviolet (UV) pulse. With both pulses at a short (~60 fs) delay, the damage threshold of the UV pulse is only 10% of its normal value. Considerable reduction of UV damage threshold is observed when two pulses are at ± 1.3 ps delay. The damage feature size of the combined pulses is similar to that of a single UV pulse. A modified rate equation model with the consideration of defect states is used to help explain these results. This concept can be applied to shorter wavelengths, e.g. XUV and X-ray, with the required fluence below their normal threshold. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|