Work function and negative electron affinity of ultrathin barium fluoride films
| Autor: | Marco Girolami, Riccardo Polini, V. Serpente, Alessandro Bellucci, Alessio Mezzi, Riccardo Carducci, Daniele M. Trucchi, Eleonora Bolli, M. Mastellone, Saulius Kaciulis |
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| Rok vydání: | 2020 |
| Předmět: |
010302 applied physics
Materials science Inorganic chemistry Barium fluoride work function 02 engineering and technology Surfaces and Interfaces General Chemistry UPS Settore CHIM/03 021001 nanoscience & nanotechnology Condensed Matter Physics barium fluorides negative electron affinity ups xps 01 natural sciences Surfaces Coatings and Films chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry 0103 physical sciences XPS Materials Chemistry Work function 0210 nano-technology |
| Zdroj: | SIA. Surface and interface analysis (2020). doi:10.1002/sia.6832 info:cnr-pdr/source/autori:Mezzi, Alessio; Bolli, Eleonora; Kaciulis, Saulius; Mastellone, Matteo; Girolami, Marco; Serpente, Valerio; Bellucci, Alessandro; Carducci, Riccardo; Polini, Riccardo; Trucchi, Daniele M./titolo:Work function and negative electron affinity of ultrathin barium fluoride films/doi:10.1002%2Fsia.6832/rivista:SIA. Surface and interface analysis/anno:2020/pagina_da:/pagina_a:/intervallo_pagine:/volume |
| ISSN: | 1096-9918 0142-2421 |
| Popis: | Thin films of barium fluorides with different thicknesses were deposited on GaAs substrate by electron beam evaporation. The aim of the work was to identify the best growth conditions for the production of coatings with a low work function suitable for the anode of hybrid thermionic-photovoltaic (TIPV) devices. The chemical composition and work function ? of the films with different thicknesses were investigated by X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). The lowest value of ? = 2.1 eV was obtained for the film with a thickness of ~2 nm. In the valence band spectra of the films at low kinetic energy, near the cutoff, a characteristic peak of negative electron affinity was present. This effect contributed to a further reduction of the film's work function. |
| Databáze: | OpenAIRE |
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