Response to the comment by C. Kisielowski, H.A. Calderon, F.R. Chen, S. Helveg, J.R. Jinschek, P. Specht, D. Van Dyck on the article 'On the influence of the electron dose-rate on the HRTEM image contrast' by J. Barthel, M. Lentzen, A. Thust, Ultramicroscopy 176 (2017) 37–45
| Autor: | Markus Lentzen, A. Thust, Juri Barthel |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Condensed matter physics
Chemistry Nanotechnology 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences humanities Atomic and Molecular Physics and Optics Image contrast Electronic Optical and Magnetic Materials Transmission electron microscopy 0103 physical sciences Magnitude (astronomy) Electron dose 010306 general physics 0210 nano-technology High-resolution transmission electron microscopy Instrumentation |
| Zdroj: | Ultramicroscopy. 179:113-115 |
| ISSN: | 0304-3991 |
| Popis: | In a recent article [1] we examined the influence of the applied electron dose rate on the magnitude of the image contrast in high-resolution transmission electron microscopy (HRTEM). We concluded that the magnitude of the image contrast is not substantially affected by the applied electron dose rate. This result is in obvious contradiction to numerous earlier publications by Kisielowski and coworkers [2-7], who commented our recent article due to this contradiction. The present short communication is a response to the comment of Kisielowski and coworkers on our recent article, where we provide additional arguments supporting our initial findings and conclusions on the magnitude of the image contrast in HRTEM. |
| Databáze: | OpenAIRE |
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