Plasma Switch-Based Technology for High-Speed and High-Power Impedance Tuning
| Autor: | Dimitrios Peroulis, Abbas Semnani, Sergey Macheret, Zach Vander Missen |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Signal Processing (eess.SP)
Power gain business.industry Computer science Smith chart Bandwidth (signal processing) Electrical engineering FOS: Physical sciences 020206 networking & telecommunications Tuner 02 engineering and technology 01 natural sciences Physics - Plasma Physics 010305 fluids & plasmas Stub (electronics) Plasma Physics (physics.plasm-ph) 0103 physical sciences FOS: Electrical engineering electronic engineering information engineering 0202 electrical engineering electronic engineering information engineering Radio frequency Transient (oscillation) Electrical Engineering and Systems Science - Signal Processing business Electrical impedance |
| Zdroj: | 2021 IEEE 21st Annual Wireless and Microwave Technology Conference (WAMICON). |
| Popis: | This paper introduces a new technology for a high-speed, high-power mobile form-factor tuner utilizing gas discharge tube plasma cells as switching components. To the best of our knowledge, this represents the first plasma-enabled RF matching network. Technology development is reviewed, the fabrication and measurement of a proof-of-concept switched stub impedance tuner are presented, and techniques for improvement are discussed. The proof-of-concept impedance tuner functions with a 27% bandwidth from 3 to almost 4 GHz and shows a power gain better than -2.5 dB across all switching state-frequency combinations at a 50 W input power level with spread coverage of the Smith chart. State change transient timing is measured to be on the order of 500 ns. This technology demonstration highlights the potential of miniaturized, rapidly-tunable, high-power, plasma-based RF devices. Comment: 4 pages, 7 figures, published in IEEE Wireless and Microwave Technology Conference (WAMICON), 2021 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|