Physical Processes and Plasma Parameters in a Radio-Frequency Hybrid Plasma System for Thin-Film Production with Ion Assistance

Autor:	Elena Kralkina, A.F. Alexandrov, Vladimir Pavlov, Vadim Odinokov, Aleksandr Nikonov, V. A. Sologub, Konstantin Vavilin, P.A. Nekludova
Jazyk:	angličtina
Rok vydání:	2019
Předmět:	Materials science business.industry Plasma parameters InformationSystems_INFORMATIONSTORAGEANDRETRIEVAL Optoelectronics Plasma Radio frequency Thin film business GeneralLiterature_REFERENCE(e.g. dictionaries encyclopedias glossaries) Ion
Databáze:	OpenAIRE
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