Fabrication of buried nanostructures by atomic layer deposition

Autor:	Seppo Honkanen, Jari Turunen, Rizwan Ali, Matthieu Roussey, Muhammad Saleem
Jazyk:	angličtina
Rok vydání:	2018
Předmět:	Diffraction Multidisciplinary Fabrication Nanostructure Materials science business.industry lcsh:R Metamaterial Physics::Optics lcsh:Medicine Conformal map 02 engineering and technology Dielectric 021001 nanoscience & nanotechnology 01 natural sciences Article 010309 optics Atomic layer deposition 0103 physical sciences Optoelectronics lcsh:Q 0210 nano-technology business lcsh:Science Layer (electronics)
Zdroj:	Scientific Reports, Vol 8, Iss 1, Pp 1-10 (2018) Scientific Reports
ISSN:	2045-2322
DOI:	10.1038/s41598-018-33036-3
Popis:	We present a method for fabricating buried nanostructures by growing a dielectric cover layer on a corrugated surface profile by atomic layer deposition of TiO2. Selecting appropriate process parameters, the conformal growth of TiO2 results in a smooth, nearly flat-top surface of the structure. Such a hard surface can be easily cleaned without damage, making the nanostructure reusable after contamination. The technique has wide applicability in resonance-domain diffractive optics and in realization of quasi-planar metamaterials. We discuss design issues of such optical elements and demonstrate the method by fabricating narrow-band spectral filters based on the guided-mode resonance effect. These elements have strong potential for, e.g., sensing applications in harsh conditions.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0a3a5b0e8400fd3923019c3a85de2821 http://link.springer.com/article/10.1038/s41598-018-33036-3 Zobrazit plný text záznamu Plný text ve formátu PDF Plný text ve formátu HTML
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