The deposition mechanism of atmospheric pressure glow plasma polymerized hexafluoropropene: Gas phase analysis of HFP plasma
| Autor: | Ren Ozaki, Masuhiro Kogoma, Kunihito Tanaka |
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| Rok vydání: | 2010 |
| Předmět: |
chemistry.chemical_classification
Double bond Atmospheric pressure Chemistry Metals and Alloys Analytical chemistry Atmospheric-pressure plasma Surfaces and Interfaces Plasma Residence time (fluid dynamics) Surfaces Coatings and Films Electronic Optical and Magnetic Materials Volumetric flow rate Materials Chemistry Deposition (phase transition) Thin film |
| Zdroj: | Thin Solid Films. 518:3566-3569 |
| ISSN: | 0040-6090 |
| Popis: | The relationship between the plasma conditions and the atmospheric pressure glow plasma deposition characteristics of the polyhexafluoropropene film, such as the film configuration, the deposition rate and products in plasma, was investigated. The higher deposition rate and the higher monomer use efficiency were obtained at a lower hexafluoropropene (monomer) concentration and a lower total gas flow rate (longer residence time in the plasma region). However, an extreme long residence time generated some granular deposits. And five gas phase products were detected by gas phase analysis. We considered that C2F4 and C4H8, which have double bond, were related to the deposition deeply. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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