Industrial 6 Inch Multicrystalline Silicon Solar Cells Fabricated Using Reactive Ion Etching with Efficiency Exceeding 18%
| Autor: | Hyun-Woo Lee, Ji Myung Shim, Eunjoo Lee, Hae-Seok Lee, Ji Soo Kim, Kyeong Yeon Cho, Soo Jeong Jo, Ji Hyun Kong, Ji-Sun Kim |
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| Rok vydání: | 2012 |
| Předmět: |
Materials science
Physics and Astronomy (miscellaneous) Silicon Open-circuit voltage business.industry General Engineering General Physics and Astronomy chemistry.chemical_element law.invention chemistry Etching (microfabrication) law Solar cell Optoelectronics Wafer Reactive-ion etching business Short circuit Common emitter |
| Zdroj: | Japanese Journal of Applied Physics. 51:10NA14 |
| ISSN: | 1347-4065 0021-4922 |
| Popis: | To obtain a lower reflectance, we applied a maskless plasma texturing technique by reactive ion etching (RIE) to acid-textured multicrystalline silicon (mc-Si) wafer. RIE texturing produced a deep and narrow textured surface with an excellent low reflectance. Owing to plasma-induced damage, unless the RIE-textured surface is subjected to proper damage removal etching (DRE), it shows drops in open circuit voltage (V oc) and fill factor (FF). RIE-textured samples with proper DRE showed sufficiently higher short circuit current (I sc) than acid-textured samples without a drop in V oc. In this study, we applied RIE texturing under optimized DRE condition to the selective emitter structure. In comparison with the acid-textured solar cells, RIE-textured solar cells have absolute gains in I sc above 200 mA. We successfully fabricated a 6-in. mc-Si solar cell with a conversion efficiency exceeding 18% by applying selective emitter technology with RIE texturing. |
| Databáze: | OpenAIRE |
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