Combination of E-jet and inkjet printing for additive fabrication of multilayer high-density RDL of silicon interposer
| Autor: | Matti Mäntysalo, Mika-Matti Laurila, Behnam Khorramdel |
|---|---|
| Přispěvatelé: | Tampere University, Electronics and Communications Engineering, Research group: Laboratory for Future Electronics, Research group: Wireless Communications and Positioning |
| Jazyk: | angličtina |
| Rok vydání: | 2017 |
| Předmět: |
Fabrication
Materials science Silicon business.industry 213 Electronic automation and communications engineering electronics Electrical engineering chemistry.chemical_element 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 7. Clean energy 01 natural sciences 0104 chemical sciences Electronic Optical and Magnetic Materials Conductor chemistry Printed electronics Interposer Optoelectronics Electrical and Electronic Engineering 0210 nano-technology business Electrical conductor Lithography Sheet resistance |
| Popis: | The additive nature and high resolution of electrohydrodynamic inkjet (E-jet) printing can be utilized for manufacturing micrometer scale conductive tracks such as those required in the high-density redistribution layers (RDLs) of silicon interposers used in electronics packaging for 3-D integration. Compared to the current lithographic fabrication method, this approach promises to increase the customizability of the process and reduce the amount of waste materials, thereby lowering the costs and the environmental impact of the manufacturing process. In this paper, multilayer interdigitated capacitor and meander resistor structures with 5/5 $\mu \text{m}$ conductor width/spacing are used to demonstrate the feasibility of E-jet printing of high-density multilayer RDLs. A sheet resistance of 28.5 $\text{m}\mathrm {\Omega }$ /square was achieved for the first metallization layer (MET1) conductors and 313.2 $\text{m}\mathrm {\Omega }$ /square for the MET2 conductors. The thickness of the conductors was 6.9 $ {\mu }\text{m}$ for MET1 and 5.4 ${\mu }\text{m}$ for MET2. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|