Fabrication of three-dimensional high-aspect-ratio structures by oblique-incidence Talbot lithography
| Autor: | Ryu Ezaki, Yasuhiro Takaya, Yoshihiko Makiura, Yasuhiro Mizutani, Tsutomu Uenohara, Naoki Ura |
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| Rok vydání: | 2020 |
| Předmět: |
Diffraction
Materials science Physics::Optics FOS: Physical sciences 02 engineering and technology Applied Physics (physics.app-ph) 01 natural sciences law.invention 010309 optics Optics law 0103 physical sciences Talbot effect Diffraction grating Lithography business.industry Physics - Applied Physics 021001 nanoscience & nanotechnology Aspect ratio (image) Atomic and Molecular Physics and Optics Light intensity Angle of incidence (optics) Photolithography 0210 nano-technology business Physics - Optics Optics (physics.optics) |
| Zdroj: | Optics express. 28(24) |
| ISSN: | 1094-4087 |
| Popis: | Developing a suitable production method for three-dimensional periodic nanostructures with high aspect ratios is a subject of growing interest. For mass production, Talbot lithography offers many advantages. However, one disadvantage is that the minimum period of the light intensity distribution is limited by the period of the diffraction grating used. To enhance the aspect ratio of fabricated nanostructures, in the present study we focus on multi-wave interference between diffracted waves created using the Talbot effect. We propose a unique exposure method to generate multi-wave interference between adjacent diffraction orders by controlling the angle of incidence of an ultraviolet (UV) light source. Using finite-difference time-domain simulations, we obtain fringe patterns with a sub-wavelength period using a one-dimensional periodic grating mask. Moreover, we demonstrate the practical application of this approach by using UV lithography to fabricate sub-wavelength periodic structures with an aspect ratio of 30 in millimeter-scale areas, indicating its suitability for mass production. Comment: 11 pages, 8 figures, 3 tables |
| Databáze: | OpenAIRE |
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