| Autor: |
Robbert Wilhelmus Elisabeth van de Kruijs, Gosse de Vries, Libor Juha, Iwanna Jacyna, Marek Jurek, Dorota Klinger, M.A. Smithers, Frank Scholze, Sebastian Strobel, Tomáš Burian, Hartmut Enkisch, Eric Louis, Karel Saksl, Barbara Keitel, Sven Toleikis, Martin Hermann, Siegfried Schreiber, Jerzy B. Pelka, V. Vozda, Konstantin Nikolaev, Henk van Wolferen, Bart Faatz, Elke Plönjes, Ryszard Sobierajski, R.A. Loch, Enrico G. Keim, Rilpho Ludovicus Donker, Frank Siewert, Igor Alexandrovich Makhotkin, Igor Milov, Tobias Mey, Kai Tiedtke, Jaromír Chalupský, Jacobus Marinus Sturm, Věra Hájková |
| Přispěvatelé: |
XUV Optics |
| Jazyk: |
angličtina |
| Rok vydání: |
2018 |
| Předmět: |
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| Zdroj: |
Journal of the Optical Society of America. B: Optical physics, 35(11), 2799-2805. Optica Publishing Group |
| ISSN: |
0740-3224 |
| Popis: |
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme ultraviolet (XUV) free-electron laser (FEL) pulses below the critical angle of reflectance at the FEL facility in Hamburg (FLASH) was experimentally analyzed. The multi-shot damage threshold is found to be lower than the single-shot damage threshold. Detailed analysis of the damage morphology and its dependence on irradiation conditions justifies the assumption that cavitation induced by the FEL pulse is the prime mechanism responsible for multi-shot damage in optical coatings. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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