Structure, electronic properties and electron energy loss spectra of transition metal nitride films
| Autor: | Panos Patsalas, L. E. Koutsokeras, Grigorios Matenoglou |
|---|---|
| Přispěvatelé: | Κουτσοκέρας, Λουκάς Ε. |
| Rok vydání: | 2013 |
| Předmět: |
Materials science
aes Transition metal nitrides Analytical chemistry preferred orientation chemistry.chemical_element coatings Titanium nitride metallization nitrogen Nitrides Pulsed laser deposition Materials Chemistry Electronic band structure Microstructure Plasmon Electron energy loss spectroscopy Metals and Alloys Transition metals Materials Engineering Surfaces and Interfaces Surfaces Coatings and Films Electronic Optical and Magnetic Materials optical-properties X-ray reflectivity eels chemistry thin-films xps Engineering and Technology Electron configuration Tin electronics properties |
| Zdroj: | Thin Solid Films. 528:49-52 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2012.06.086 |
| Popis: | We present a thorough and critical study of the electronic properties of the mononitrides of the group IV-V-VI metals (TiN, ZrN, HfN, NbN, TaN, MoN, and WN) grown by Pulsed Laser Deposition (PLD). The microstructure and density of the films have been studied by X-Ray Diffraction (XRD) and Reflectivity (XRR), while their optical properties were investigated by spectral reflectivity at vertical incidence and in-situ reflection electron energy loss spectroscopy (R-EELS). We report the R-EELS spectra for all the binary TMN and we identify their features(metal-d plasmon and N-p + metal-d loss) based on previous ab-initio band structure calculations. The spectral positions of p + d loss peak are rationally grouped according to the electron configuration (i.e. of the respective quantum numbers) of the constituent metal. The assigned and reported R-EELS spectra can be used as a reference database for the colloquial in-situ surface analysis performed in most laboratories. (c) 2012 Elsevier B.V. All rights reserved. Thin Solid Films |
| Databáze: | OpenAIRE |
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