Wave and Particle in Molecular Interference Lithography
| Autor: | Andras G. Major, Markus Arndt, Hendrik Ulbricht, Stefan Truppe, Thomas Juffmann, Sarayut Deachapunya, Philipp Geyer |
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| Rok vydání: | 2010 |
| Předmět: |
Physics
Diffraction Quantum Physics Condensed matter physics business.industry General Physics and Astronomy FOS: Physical sciences Quantum imaging 01 natural sciences 010305 fluids & plasmas law.invention Interference lithography Interferometry Optics Nanolithography law 0103 physical sciences Matter wave Scanning tunneling microscope 010306 general physics business Quantum Physics (quant-ph) Lithography |
| DOI: | 10.48550/arxiv.1001.0468 |
| Popis: | The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental demonstration of quantum interference lithography with complex molecules. Molecular matter-wave interference patterns are deposited onto a reconstructed Si(111) 7x7 surface and imaged using scanning tunneling microscopy. Thereby both the particle and the quantum wave character of the molecules can be visualized in one and the same image. This new approach to nanolithography therefore also represents a sensitive new detection scheme for quantum interference experiments. Comment: 4 pages, 3 figures |
| Databáze: | OpenAIRE |
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