Zdroj: |
Ruotsalainen, T, Solehmainen, K, Hiitola-Keinänen, J, Hast, J, Känsäkoski, M, Gold, H, König, M & Rolin, C 2011, Towards roll-to-roll manufacturing: organic thin film transistors based on nanoimprinting lithography technique . in Proceedings of the 8th International Conference on Multi-Material Micro Manufacture, 4M 2011 . Research Publishing Services, pp. 325-327, 8th International Conference on Multi-Material Micro Manufacture, 4M 2011, Stuttgart, Germany, 8/11/11 . https://doi.org/10.3850/978-981-07-0319-6_239 |
Popis: |
In this paper bottom gate bottom contact organic thin film transistors utilizing R2R-processes for gate manufacturing, application of dielectric, application of imprint resist, and hot-embossing of source-drain patterns are demonstrated. Also the other process steps involved in the manufacturing process i.e. dry etching, evaporation of source-drain electrodes, lift-off, and evaporation of semiconductor can be made in a roll-to-roll fashion, thus making the manufacturing route roll-to-roll compatible. The work presented in this paper demonstrates that roll-to-roll NIL is applicable to create source-drain structures with channel lengths much smaller than achieved by other traditional R2R-printing techniques. |