Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology

Autor:	Roel Baets, J. Van Campenhout, Dirk Taillaert, Vincent Wiaux, Peter Bienstman, Stephan Beckx, D. Van Thourhout, Pieter Dumon, Bert Luyssaert, Wim Bogaerts
Rok vydání:	2005
Předmět:	Technology and Engineering Materials science business.industry Photonic integrated circuit Nanophotonics Physics::Optics Silicon on insulator Integrated circuit Atomic and Molecular Physics and Optics law.invention CMOS law Optoelectronics Photonics business Lithography Photonic crystal
Zdroj:	JOURNAL OF LIGHTWAVE TECHNOLOGY
ISSN:	1558-2213 0733-8724
DOI:	10.1109/jlt.2004.834471
Popis:	High-index-contrast, wavelength-scale structures are key to ultracompact integration of photonic integrated circuits. The fabrication of these nanophotonic structures in silicon-on-insulator using complementary metal-oxide-semiconductor processing techniques, including deep ultraviolet lithography, was studied. It is concluded that this technology is capable of commercially manufacturing nanophotonic integrated circuits. The possibilities of photonic wires and photonic-crystal waveguides for photonic integration are compared. It is shown that, with similar fabrication techniques, photonic wires perform at least an order of magnitude better than photonic-crystal waveguides with respect to propagation losses. Measurements indicate propagation losses as low as 0.24 dB/mm for photonic wires but 7.5 dB/mm for photonic-crystal waveguides.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0412d26f4d7558d06e2304bf70d3518e https://doi.org/10.1109/jlt.2004.834471 Zobrazit plný text záznamu